NANOSTRUCTURE NIO FILMS GROWN BY OBLIQUE ANGLE DEPOSITION
Keywords:
Nanostructure, NiO, Sputtering, Oblique angle depositionAbstract
In this paper, the reactive magnetron sputtering with oblique angle deposition technique was used to grow nanostructure nickel oxide (NiO) films on silicon (100) wafer substrate. The nanostructure NiO films were prepared under different incident deposition flux angle () from 0 to 85. The physical structural, morphology and optical transmission of the nanostructure NiO films were investigated by x-ray diffraction, field emission scanning electron microscopy, transmission electron microscopy and UV-Vis-NIR spectroscopy. The results indicated that the prepared sample deposited at = 0-40 presented dense nanocolumnar structures. However, the sample with 70 showed isolated nanocolumnar nanostructures. The thickness of the nanocolumnars was decreasing when increased. Finally, the results indicated that the morphology, optical property of the nanostructure NiO film were strongly related by incident deposition flux angle.
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