Prathumsit J, Phae-ngam W, Chaikeeree T, Mungkung N, Lertvanithphol T, Horprathum M, Gitgeatpong G. INFLUENCE OF N2 FLOW RATE ON THE PROPERTIES OF VANADIUM NITRIDE THIN FILMS DEPOSITED BY REACTIVE DC MAGNETRON SPUTTERING. Suranaree J Sci Technol [internet]. 2023 Oct. 9 [cited 2026 Sep. 10];30(4):030125(1-5). available from: https://ph04.tci-thaijo.org/index.php/SUJST/article/view/2237