Prathumsit, J., Phae-ngam, W., Chaikeeree, T., Mungkung, N., Lertvanithphol, T., Horprathum, M. and Gitgeatpong, G. (2023) “INFLUENCE OF N2 FLOW RATE ON THE PROPERTIES OF VANADIUM NITRIDE THIN FILMS DEPOSITED BY REACTIVE DC MAGNETRON SPUTTERING”, Suranaree Journal of Science and Technology, 30(4), pp. 030125(1–5). doi: 10.55766/sujst-2023-04-e02237.