PRATHUMSIT, J.; PHAE-NGAM, W.; CHAIKEEREE, T.; MUNGKUNG, N.; LERTVANITHPHOL, T.; HORPRATHUM, M.; GITGEATPONG, G. INFLUENCE OF N2 FLOW RATE ON THE PROPERTIES OF VANADIUM NITRIDE THIN FILMS DEPOSITED BY REACTIVE DC MAGNETRON SPUTTERING. Suranaree Journal of Science and Technology, [S. l.], v. 30, n. 4, p. 030125(1–5), 2023. DOI: 10.55766/sujst-2023-04-e02237. Disponível em: https://ph04.tci-thaijo.org/index.php/SUJST/article/view/2237. Acesso em: 15 sep. 2026.