SONKLIN, T.; MUNTHALA, D.; LEUASOONGNOEN, P.; JANPHUANG, P.; POJPRAPAI, S. THE EFFECT OF ANNEALING TEMPERATURE UNDER OXYGEN GAS ON ZnO THIN FILM MICROSTRUCTURE. Suranaree Journal of Science and Technology, [S. l.], v. 33, n. 4, p. 030404(1–8), 2026. DOI: 10.55766/sujst12227. Disponível em: https://ph04.tci-thaijo.org/index.php/SUJST/article/view/12227. Acesso em: 16 sep. 2026.