PHAE-NGAM, W. .; PRATHUMSIT, J.; GITGEATPONG, G. .; CHAIKEEREE, T. .; BODINTHITIKUL, N. .; LERTVANITHPHOL, T. .; HORPRATHUM, M. .; JUTAROSAGA, T. . High-rate Deposition of Crystalline TiHfN Ultra-thin Films by Closed-field Dual-cathode DC Unbalanced Reactive Magnetron Sputtering without External Substrate Heating. Journal of Current Science and Technology, [S. l.], v. 14, n. 3, p. Article 48, 2024. DOI: 10.59796/jcst.V14N3.2024.48. Disponível em: https://ph04.tci-thaijo.org/index.php/JCST/article/view/3478. Acesso em: 21 may. 2025.